2011
Suyog Gupta
Stanford University
“Atomic Layer Deposition of Al2O3 on GeSn and Impact of Wet Chemical Surface Pre-Treatment”
with R. Chen, J. Harris, and K.C. Saraswat |
2010
Fei Xue
University of Texas at Austin
“InAs and In0.7Ga0.3As buried channel MOSFETs with ALD gate dielectrics”
with H. Zhao, Y. Chen, Y. Wang, F. Zhou, and J. Lee |
2009
Jacopo Franco
IMEC
“Impact of Si-Passivation Thickness and Processing on NBTI Reliability of Ge and SiGe pMOSFETs”
with B. Kaczer, A. Stesmans, V. V. Afanas'ev, K. Martens, M. Aoulaiche, T. Grasser, J. Mitard, and G. Groeseneken |
2008
Marko Milojevic
University of Texas at Dallas
“In-situ XPS investigation of the “clean-up” effect through half-cycle ALD reactions on III-V substrates”
with B. Brennan, F. S. Aguirre-Tostado, C. Hinkle, H. C. Kim, B. Lee, G. Hughes, E. M. Vogel, J. Kim, and R. M. Wallace |
2007
Stanislav Markov
University of Glasgow
“Band-gap and permittivity change at high-k gate stack interfaces — device perspective”
with S. Roy, C. Fiegna, E. Sangiorgi, and A. Asenov |
2006
Laurent Thevenod
CEA-LETI/MINATEC
“Characterization of TiN/HfO2/SiO2 MOSFETs by extracting mobility from magnetoresistance measurements”
with M. Cassé, W. Desrat, M. Mouis, G. Reimbold, and F. Boulanger |
2005
Frank C. Yeh
Yale University
“SONOS-type Non-volatile Memory with All Silicon Nitride Dielectric Stack”
with Y. X. Liu, X. W. Wang, and T.P. Ma |
2004
Miaomiao Wang
Yale University
“Tunneling Spectroscopy Study of Traps in MOS Structures with
High-k Gate Dielectrics”
with W. He and T.P. Ma |
2003
Mike J. Hale
UCSD
“Oxygen and Oxide Bonding on GaAs(001)- c(2x8)/(2x4): An Atomic
Understanding of Fermi Level Pinning and Unpinning”
with J. Z. Sexton, S. I. Yi, D. L. Winn,
M. Passlack (Motorola), and A. C. Kummel |
2002
Wenjuan Zhu
Yale University
“Mobility extraction for MOSFET's made with ultra-thin high-k
dielectrics: correct accounting of channel carriers”
with T.P. Ma, T. Tamagawa, and W.Y. Wang |
2001
Thomas Kauerauf
IMEC
“Low Weibull slope of breakdown distributions in high-k layers”
with Robin Degraeve, Charlotte Soens, Guido Groeseneken, and Eduard Cartier (IBM/IMEC) |
2000
Z. J. Luo
Yale University
“Characterization of Ultra-thin (~1nm) Zr Silicate for CMOS
Gate Application”
with T.P. Ma, E. Cartier, M. Copel, T. Tamagawa, and
B. Halpern |
1999
Shigayasu Uno
Osaka University
“I-V Characteristics of Ultra Thin Oxide Films after Soft Breakdown”
with T. Sakura, Y. Kamakura, and K. Taniguchi |
1998
M. K. Das
Purdue University
“Inversion Channel Mobility in 4H- and 6H-SiC MOSFETs”
with J.A. Cooper, Jr., M.R. Melloch,
and M.A. Capano |
1997
Tanya Nigam
IMEC
“Is the Constant Current Charge-to- Breakdown Test Still a
Valid Tool to Study the Reliability of MOS Structures?”
with R. Degraeve, G. Groeseneken, and M. Heyns |
1996
Jan De Blauwe
IMEC
“Degradation and Nitridation Dependence of Steady-State SILC”
with R. Degraeve, R. Bellens, J. Van Houdt, G. Groesenenken,
and H.E. Maes |
1995
K. A. Ellis
Cornell University
“Gas Phase Chemistry of N2O Furnace Oxidation”
with R.A. Buhrman |
